photoetching信息详情
n.光刻,[电子]光刻法;照相腐蚀法;照相感光制凸版
photoelectron spectroscopy───[物][分化]光电子能谱法;电光子分光光谱
photoelectric effect───光效应,[物]光电效应
Photoetching polysilicon forms force sensitive resistance bar.───经光刻后便形成力敏电阻条。
Aligning method, aligning substrate, photoetching device and component manufacturing method.───对准方法,对准基底,光刻装置和器件制造方法。
Photoetching device, mirror element, device producing method and beam transfering system.───光刻装置,镜元件,器件制造方法,及束传送系统。
The material of oar shape chemistry that phosphor turns indium chip to call photoetching glue through a kind on product line has package.───磷化铟晶片在出产线上经过一种称为光刻胶的浆状化学物质进行包裹。
Photoetching polysilicon forms force sensitive resistance bar.───多晶硅经光刻后便形成力敏电阻条。
In addition, 64 serial number by factory photoetching , leave out costly user process designing, can prevent serial number to be distorted.───此外,64位序列号由工厂光刻,省去了低廉的用户编程,并可预防序列号被窜改。
obtaining a graph of a source drain electrode of the device by evenly gluing and photoetching the insulated mediate layer material;───在绝缘介质层材料上匀胶后光刻得到器件源漏电极的图形;
Studies on the Acid-Generation Properties of a New Phthalocyanine Derivative as Photoetching Recording Materials───一种新型酞菁类光蚀刻记录材料的光生酸性质研究
using photoetching and stripping technologies to prepare the gate electrode of a device on the plastic substrate;───使用光刻和剥离工艺在塑料衬底上制备出器件的栅电极;
Aligning method, aligning substrate, photoetching device and component manufacturing method.
In addition, 64 serial number by factory photoetching , leave out costly user process designing, can prevent serial number to be distorted.
In the microfabrication process, photolithography photoetching method and ion-exchanging technology were introduced and investigated for the special glass substrate.
When the probe inducing photoetching film is used for probe inducing surface plasma resonance photoetching, the corrosion linewidth is greatly reduced.
Brazing quality and product reliability are both increased as using high frequency pulse microplasma arc heating process for assembly brazing of cathode and photoetching grid of electron tube.
Photoetching device, mirror element, device producing method and beam transfering system.
Photoetching polysilicon forms force sensitive resistance bar.
Sucker, photoetching projective apparatus, method for producing sucker and component producing method.
It can be used in microelectronic processing, photoetching and scan microscopic focusing or imaging system.
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