photolithography信息详情
n.影印石版术；照相平印术
photolithograph───n.影印石版画；照相平版印刷品；vt.影印石版
photolithographs───n.影印石版画；照相平版印刷品；vt.影印石版
photolithographed───n.影印石版画；照相平版印刷品；vt.影印石版
photolithographer───n.影印石版画；照相平版印刷品(photolithograph的变形)
photolithographic───adj.光刻法的；照相平版印刷的
photolithographing───n.影印石版画；照相平版印刷品；vt.影印石版
chromolithography───n.石版或锌版套色印刷术；彩色石印术
autolithography───n.直接平版印刷法
photomicrography───n.显微照相术；显微摄影术
Spherical aberration can damage image quality in photolithography.───球面像差能破坏光刻的成像质量。
Why not use photolithography to make nano structures?───为什么不使用光蚀刻法制造奈米结构？
First, consider the advantages and disadvantages of photolithography.───首先，想想光蚀刻法的优点跟缺点。
One of the procedures used in making monolithic integrated circuits which overcomes this problem is photolithography based on photoresists.───规程的当中一个被使用在做整体集成电路克服这个问题是石版影印根据光致抗蚀剂。
that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring.───测试晶圆片-影印过程中用于颗粒计算、量溶解度和检测金属污染的晶圆片。
One embodiment of the present invention provides techniques and systems for determining modeling parameters for a photolithography process.───一种用于为光刻工艺确定参数的方法，所述方法包括：接收布局；
Transmission phase gratings with continuous relief structures are fabricated with one step direct laser writing grayscale photolithography.───利用一步激光直写灰阶光刻方法制作了具有连续浮雕结构的透射式相位光栅。
The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division.───无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。
Contact-mode photolithography was used for realizing the monolithic integration of 0.───采用光学接触式光刻方式，实现了单片集成0。
In the microfabrication process,(sentencedict.com) photolithography photoetching method and ion-exchanging technology were introduced and investigated for the special glass substrate.
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The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division.
Defocusing effect on the patterns of microlens array imaging photolithography is analyzed, and tolerance of defocusing range of the system is given.
Simulation and experiments show that for point array or hole array patterns with the same sizes maskless interference photolithography is much simple than the traditional photolithography.
Atom photolithography is a new application of atom optics in microfabrication technical field.
How to use the measured effective diffusion length and scanner illumination condition to demonstrate photolithography line width uniformity is introduced.
The principle for eliminating the diffraction error of photolithography with lens array is demonstrated by optical transfer function method.