exposure dose发音

意思翻译

照射剂量

相似词语短语

dose───vt.给药；给…服药；vi.服药；n.(Dose)人名；(德)多泽；(意、西、葡、塞)多塞；(英)多斯；n.剂量；一剂，一服

exposure───n.暴露；曝光；揭露；陈列

daily dose───日剂量；一日量；日剂量; 一日量

exposure x───曝光x

doxological exposure───强迫症暴露

double exposure───[摄]双重曝光，两次曝光

arsenate exposure───砷酸盐暴露

extravascular dose───血管外剂量

dose escalation───剂量递增

双语使用场景

Exposure dose should be changed with the thickness of SU-8 photoresist.───SU - 8胶的厚度确定曝光剂量的大小。

exposure conditions including the exposure dose and source to film distance were changed to find the optimal one.───改变源片距离和曝光剂量，进一步突出所能发现的误差，确定最佳曝光条件；

Methods the exposure dose, imaging time and image quality were compared in the two digital imaging system.───方法对两种数字化成像系统的曝光剂量、成像时间和图像质量进行比较分析。

Conclusions The navigatation time of submarine under sea is the main factor influencing the internal exposure dose of the submarines.───结论潜艇水下航行的时间是影响艇员内照射剂量的重要因素；

Methods The low luminous and high sensitive CCD camera was used in the X-ray auto exposure dose control.───方法：选择低照度高灵敏度的CCD摄像机，配制X射线剂量自动控制器。

The cloudiness rate of vitreous body and eye lens were increased with exposure dose.───玻璃体、晶状体混浊率随着工作接触剂量的增加而增加。

Dose equivalent of exposure dose in mammary is the highest, those in thyroid is the secondary, and genitical gland area has the lowest dose.───各敏感器官以乳腺受照剂量当量最大，其次为甲状腺，性腺区最少。

Study of Surveillance of Exposure Dose of Radiation Workers and Patients───介入放射工作人员及患者受照剂量监测研究

Investigation of Indoor Radioactive Contamination and Exposure Dose Estimate───居室中放射性污染调查与辐射剂量估算

英语使用场景

The results of numerical simulation show the lesion of photoaging skin can be selectively damaged if the wavelength, exposure duration and exposure dose of irradiated ligh are reasonably selected.

The cloudiness rate of vitreous body and eye lens were increased with exposure dose.

Objective To investigate the magnitude of dose equivalent of exposure dose in different organs of human being using high and low KV X-Ray photography in chest.

The incidence rate of neurasthenic syndrome was 61.13%. It had rising trend with accumulative exposure dose.

Finally, the results of selecting the optimum exposure dose for two kinds of electron positive resists and the photos of LSI masks fabricated by this method are given.

The exposure dose distribution and line width control for the laser direct writing system are analyzed. Some experiments are also carried out.