electrochemical etching信息详情
电化学腐蚀
etching───adj.蚀刻的;v.蚀刻;刻画(etch的ing形式);n.蚀刻术;蚀刻版画
electro-etching───电腐蚀(electroetch的现在分词)
etching gel───蚀刻胶
etching solution───蚀刻剂;蚀刻溶液
etching primer───腐蚀性涂料;[化] 防护涂料; 磷化底漆; 洗涤底漆; 反应性底漆
electrochemical cell───[电]电化电池
callot etching───卡洛特腐蚀
plowman etching───犁铧蚀刻
electrolytically etching───电解腐蚀
the third chapter Porous silicon was prepared by pulsed and dc electrochemical etching methods under the equivalent etching condition.───第三章研究了用脉冲电化学腐蚀制备均匀发光多孔硅。
Based on electrochemical etching principles, the paper fabricated the micrometer scale wire electrodes used in WEMM.───本文基于电化学腐蚀原理,制备微细电化学线切割加工中使用的微米尺度线电极。
PSMs were prepared by the pulsed electrochemical etching method and the experimental conditions were optimized.───用电化学脉冲腐蚀法制备多孔硅微腔,优化了实验参数。
Firstly, PSMs were prepared by the pulsed electrochemical etching method and the experimental conditions were optimized.───用电化学脉冲腐蚀法制备多孔硅微腔,优化了实验参数。
New developments on electrochemical etching processes at the Atomic Energy organization of Iran.───伊朗原子能机构电化学蚀刻技术的新发展…[中国核科技信息与经济研究院]。
The fabrication of alloy microelectrodes by electrochemical-etching method is presented.───采用电化学刻蚀法制备了合金微电极。
Double-cell electrochemical etching is used to prepare PS based on p+ type silicon.───以p+型硅片为基底,通过双槽电化学腐蚀法制备多孔硅。
Preparation of Uniformly Luminescence Porous Silicon by Pulsed Electrochemical Etching Method───电化学脉冲腐蚀制备均匀发光多孔硅
With the orthogonal experiment, porous silicon(PS) was fabricated by galvanostatic electrochemical etching method.
Porous silicon (PS) was prepared by the electrochemical etching technique with self-made cell. The orthogonal experimental method is adopted to design anodization parameters.
P-type Silicon crystal plates have been adopted in the paper. Then the electrochemical etching experiments are done in three electrodes electrobath .
The electrochemical etching technique of PN junction etch-stop in alkaline solution KOH is one of foundational methods of fabricating three-dimension silicon microstructures.
Tungsten STM tips made by electrochemical etching are always covered with a layer of oxide film, which greatly affects the quality of STM images.
Firstly, PSMs were prepared by the pulsed electrochemical etching method and the experimental conditions were optimized.
We propose to machine cylindrical micro-pins using the electrochemical etching method to control their shape and dimension.
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