e-beam信息详情
电子束
beam───n.横梁；光线；电波；船宽；[计量]秤杆；vt.发送；以梁支撑；用…照射；流露；n.(Beam)人名；(阿拉伯)贝亚姆；(英)比姆；vi.照射；堆满笑容
particle beam───粒子束，[高能]粒子束流
obliteration beam───闭塞光束
fleshing beam───刮皮板
balance beam───n.平衡木；天平横梁；平衡杆，秤杆
cross-beam───横梁；大梁
chamfering beam───倒棱梁
breast beam───撑梁；船首横梁，[纺]胸梁；船首横梁; 胸梁
tie-beam───连接梁
sodium titanate nanowire-based device is fabricated via e-beam lithography techniques.───利用电子束光刻技术制作了基于钛酸钠纳米线的纳米器件。
high speed Patten Generator is designed for nanometer E-beam lithography system.───为满足纳米级电子束曝光系统的要求，设计了高速图形发生器。
proximity effect in the E-beam lithography system was verified by experiments.───电子束曝光机完成有关邻近效应的实验。
Several companies and research institutes are currently developing e-beam tools for direct write lithography and other niche applications.───尽管如此，目前仍有许多公司和研究机构在继续研究和开发电子束光刻设备。
Thin Film thickness monitoring in thermal, e-beam, sputtering, magnetron, ion and laser deposition.───在热，电子束，溅射，磁控，离子和激光沉积中，用做厚度监测
Using a magnetic field to curve the path of the e-beam permits screening of the hot filament.───用一个磁场使电子束走曲线路径能够屏蔽热阴极。
Refers to an e-beam evaporator or exposure system.───指电子束蒸发器或曝光系统。
Using PMMA e-beam resist, a line resolution down t0 0. 1 ym has been achieved with this system.───使用PMMA电子束抗蚀剂，在该系统上获得0.1微米的线分辨率。
Structural Design and Geometrical Accuracy Analysis of a New Precision Stage for E-Beam Lithography Machine───电子束曝光机的一种新型精密工件台结构特点及几何精度分析
E-beam tools are used in photomask writing, but many believe the technology will never be fast enough for high-volume semiconductor lithography.
This paper describes the aberration and distortion of e-beam deflection magnetic field in which the parameters keep close to in the normal solution.
After electronic forming, we'll get one piece of holography nickel shim which records holography images and other information(for example, E-beam or Mole hidden text) in 2D/3D or Dot-master effect.
Based on the SDS-3 E-beam lithography machine, the electrostatic deflection of the folded plate structure was used instead of the electrostatic deflection of the plate.
A compact output switch for a water pulse forming line(PFL) e-beam accelerator was designed.