chemical vapor deposition发音

意思翻译

化学气相沉积；化学汽相淀积

相似词语短语

vapor deposition───蒸镀；汽相淀积；汽相淀积，蒸镀

deposition───n.沉积物；矿床；革职；[律]（在法庭上的）宣誓作证，证词

vapor───n.蒸气；水蒸气（等于vapour）

chemical───n.化学制品，化学药品；adj.化学的

vapor max───蒸汽最大值

vapor rub───蒸汽摩擦

digesting deposition───消化沉积

vapor beast───蒸汽野兽

solace vapor───日光蒸汽

双语使用场景

diamond thin films were grown by hot-filament chemical vapor deposition.───采用热丝化学气相沉积生长出优异的金刚石薄膜。

carbon nanotubes were synthesized by the heat filament chemical vapor deposition.───用的碳纳米管是用热灯丝化学气相沉积法合成的。

carbon nanotubes were synthesized by the heat filament chemical vapor deposition (CVD).───碳纳米管由化学气相沉积法(CVD)合成。

Resin impregnation was used to density carbon fiber preforms after they had been densified by chemical vapor deposition (CVD).───将炭纤维坯体CVD增密至不同密度，再对其进行树脂浸渍。

To produce flexible transistor arrays powerful enough to drive a display, engineers employ a process called chemical vapor deposition.───为了生产强大到可以驱动显示的可弯曲晶体管序列，工程师们使用了一种称为“化学气相沉积”（chemicalvapordeposition）的流程。

The substrate is subjected to a chemical vapor deposition (370) of a carbon-containing gas to grow a non-woven fabric of carbon nanotubes.───使基片进行含碳气体的化学气相沉积，以生长碳纳米管的非织造织物。

In their experiments, the scientists grew the diamond films using "pulsed liquid injection chemical vapor deposition techniques. "───在他们的试验中，科学家用脉冲液体喷射的化学汽相沉积技术来增大钻石薄膜的尺寸。

This paper gives an overview of plasma enhanced chemical vapor deposition (PECVD) used in the solar industry.───本文针对电浆辅助化学气相沉积在太阳能产业上的应用作一概略性的介绍。

Catalytic chemical vapor deposition synthesis of helical carbon nanotubes and triple helices carbon nanostructure.───化学气相沉积合成螺旋碳纳米管和三重螺旋纳米碳结构

英语使用场景

Hot cathode chemical vapor deposition method was established in order to deposit high - quality diamond films highrate.

Hot cathode chemical vapor deposition method was established in order to deposit high-quality diamond films with high deposition rate.

Composite film was prepared by on line chemical vapor deposition on float glass.

A double-deck plasma enhanced chemical vapor deposition (PECVD) facility was used to prepare silicon nitride film on the finely polished (100) plane ofp-type single crystal silicon wafer.

Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.

The defect properties in chemical vapor deposition diamond films doped by sulfur and boron were investigated by the Doppler broadening measurements and electron paramagnetic resonance (EPR).

MOCVD stands for Metalorganic Chemical Vapor Deposition, is one technology used to grow wafers from underlay with the MOCVD equipment.

Hot cathode glow discharge plasma chemical vapor deposition is a new method to deposit high-quality diamond films with high deposition rate.

Diamond film was coated by the hot filament chemical vapor deposition method.